Federal grant · cooperative agreement (b)
Purpose: Highri Optics, Inc Will Develop Cutting-edge Technology for Instrument Transfer Function (ITF) Calibration of Extreme Ultraviolet (EUV) Lithographic Tools to Enhance the Performance and Precision of Euv Tools Utilized in Semiconductor Manufacturing.activities to Be Performed: the Awardee With Develop Cutting-edge Technology for Instrument Transfer Function (ITF) Calibration of Extreme Ultraviolet (EUV) Lithographic Tools.expected Outcomes: the Proposed Technology Will Enhance the Performance and Precision of Extreme Ultraviolet Equipment.intended Beneficiaries: Researchers and U.s. Semiconductor Industry That Utilizes Extreme Ultraviolet (EUV) Lithographic Tools.subrecipient Activities: the Recipient Plans to Subaward Funds to Support Fabrication and Characterization of X-ray Optical Devices and Euv Lithography and Photomask Development, Along With Technical Consulting Services.
Committed
$283,009
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